Independent power/pressure adjustment allows operation at argon gas pressure ranges of 0.2 - 0.005mbarįilm Thickness Monitor for Agar SEM Turbo Coater (AGB7240) included standard Low voltage planar magnetron type with quick target changeĪutomatic operation of gas purge and leak functions Programmable digital control, microprocessor-basedĬurrent control independent of vacuum, 80mA max Motorised Rotary Planetary stage with manual tilt (standard)Ĥ sample tables delivered standard (specify when ordering)
Optional Cr, Ta, Au, Au/Pd, Pt, W, Ir, Ag can be quoted separately. Features & SpecificationsĪGB7234 High Resolution Sputter Coater Technical Datasheet Specifications The integrated terminating film thickness monitor allows the coating thickness to be closely controlled and reproduced for repeat samples. The dual height 150mm diameter work chamber gives easy adjustment of working distance. This ensures that the minimum coating thickness can be applied to give conductivity without compromising fine specimen detail. The rotary planetary stage with tilt ensures that highly contoured samples are evenly coated. The magnetron sputtering head has the high current capability required for sputtering chromium and a source shutter for target conditioning is provided as standard. The turbomolecular drag pump provides the high vacuum necessary for sputtering non-noble metals, while having excellent gas handling characteristics. To minimise the effect of grain size, the coater gives full control over thickness and deposition conditions.
The Agar high resolution sputter coater offers a real solution to the problems encountered when coating difficult samples for FEG SEM imaging.
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